The 29th European Symposium on Computer Aided Process Engineering, contains the papers presented at the 29th European Symposium of Computer Aided Process Engineering (ESCAPE) event held in Eindhoven, The Netherlands, from June 16-19, 2019. It is a valuable resource for chemical engineers, chemical process engineers, researchers in industry and academia, students, and consultants for chemical industries.
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Table of Contents
29th European Symposium on Computer Aided Process Engineering
Authors
Anton A. Kiss University of Manchester.
Tony Kiss is a professor and chair in chemical engineering at The University of Manchester, and a Royal Society Wolfson Research Merit Award holder. He has over a decade of industrial experience, working as Senior Project Manager and RD&I Specialist in Separation Technology at AkzoNobel - Research, Development & Innovation. Besides his industrial role, he has been appointed as part-time professor of Separation Technology at University of Twente (Sustainable Process Technology group). He holds a PhD title from University of Amsterdam, and he was also Post Doctoral research fellow at TU Delft and University of Amsterdam. During the past decade, he carried out many research & industrial projects, supervised graduation projects, published several textbooks, book chapters, and over 100 scientific articles. For the pioneering research work, he received in 2013 the Hoogewerff Jongerenprijs - a very prestigious award recognizing the most promising young scientist in The Netherlands. He also led his research team to receive in 2013 the AkzoNobel Innovation Excellence Award for the most successful industrial innovation. More information is available at: www.tonykiss.com
Edwin Zondervan University of Bremen, Germany.
University of Bremen, Germany
Richard Lakerveld The Hong Kong University of Science and Technology, Hong Kong.
The Hong Kong University of Science and Technology, Hong Kong
Leyla �zkan Eindhoven University of Technology, The Netherlands.
Eindhoven University of Technology, The Netherlands
