Advances in Imaging and Electron Physics, Volume 212, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
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Table of Contents
Part I. Papers from the Tenth International Conference on Charged Particle Optics 1. Planar multi-reflecting time-of-flight mass-spectrometer of a simple design Seitkerim B. Bimurzaev 2. Generalization of paraxial trajectory method for the analysis of non-paraxial rays Shin Fujita 3. Test and characterization of a new post-column imaging energy filter Frank Kahl, Volker Gerheim, Martin Linck, Heiko M?ller, Richard Schillinger, Stephan Uhlemann 4. Electron optics for a multi-pass transmission electron microscope Marian Mankos, Stewart A. Koppell, Brannon B. Klopfer, Thomas Juffmann, Vladimir Kolarik, Khashayar Shadman, Mark Kasevich 5. A simulation program for electron mirrors using Boundary Element Method Eric Munro, Haoning Liu, Catherine Rouse, John Rouse 6. An algorithm for simulating the geometric optics of charged particle instruments Khashayar ShadmanPart II. The Nano-aperture Ion Source 7. Introduction to focused ion beams, ion sources, and the nano-aperture ion source Leon van Kouwen 8. Nano-fluidic flow in the nano-aperture ion source Leon van Kouwen 9. Optics of ion emission from the nano-aperture ion source Leon van Kouwen 10. A model for ion-neutral scattering in the nano-aperture source Leon van Kouwen 11. Ion emission simulations of the nano-aperture ion source Leon van Kouwen 12. Processes in the ionization volume of the nano-aperture ion source Leon van Kouwen
