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Asia Pacific High-k And CVD ALD Metal Precursors Market Size, Share & Industry Trends Analysis Report by Technology (Interconnect, Capacitors, and Gates), Country and Growth Forecast, 2022-2028

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    Report

  • 57 Pages
  • October 2022
  • Region: Asia Pacific
  • Marqual IT Solutions Pvt. Ltd (KBV Research)
  • ID: 5694454
The Asia Pacific High-k And CVD ALD Metal Precursors Market should witness market growth of 6.7% CAGR during the forecast period (2022-2028).

ALD is a crucial method for the manufacture of semiconductor devices used in nanomaterials synthesis. The materials have extremely high dielectric values, allowing for quick data storage and retrieval. In structures with a high aspect ratio, the process gives great deposition conformity, which is another significant advantage.

The approach provides thickness control at the Angstrom level. Using the approach for high-? gate oxides, DRAM, and nitrides for connections and electrodes, high-? dielectric materials, such as ZrO2, HfO4, Ta2O5, and Al2O3 can be used to manufacture thin films. ALD/CVD methods are appealing primarily because they enable the growth of thin films that are very homogenous and meet the necessary parameters.

Interconnects are a fabrication process that uses Copper (Cu) or Aluminum (Al) for patterning metals as well as introducing the protective metal layers for safeguarding Silicon from potential damage within an Integrated Circuit. Specific electrical devices and devices, such as improved Metal-Insulator-Metal capacitors, Non-Volatile, organic thin-film transistors, OLEDs, and DRAMs are progressively incorporating high-k dielectric layers.

To accommodate a large presence of electronic equipment manufacturers, developing economies, such as China and Japan are analyzed. Combined with other major driving factors, the massive vendor footprint in the Asia Pacific is anticipated to propel the region to maintain its dominance in the market for high-k and ALD/CVD metal precursors. Asia-Pacific is anticipated to benefit from the increasing demand for semiconductors, as it has previously dominated the worldwide market.

The China market dominated the Asia Pacific High-k And CVD ALD Metal Precursors Market by Country in 2021, and would continue to be a dominant market till 2028; thereby, achieving a market value of $78.3 million by 2028. The Japan market is experiencing a CAGR of 6.1% during (2022-2028). Additionally, The India market would display a CAGR of 7.4% during (2022-2028).

Based on Technology, the market is segmented into Interconnect, Capacitors, and Gates. The report also covers geographical segmentation of High-k And CVD ALD Metal Precursors market. Based on countries, the market is segmented into China, Japan, India, South Korea, Singapore, Malaysia, and Rest of Asia Pacific.

The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Air Liquide S.A, Air Product & Chemicals, Inc., The Dow Chemical Company, Linde PLC, Merck KGAA, Samsung Electronics Co., Ltd., Nanmat Technology Co. Ltd., Adeka Corporation, Strem Chemicals, Inc., and Colnatec.

Scope of the Study

By Technology

  • Interconnect
  • Capacitors
  • Gates

By Country

  • China
  • Japan
  • India
  • South Korea
  • Singapore
  • Malaysia
  • Rest of Asia Pacific

Key Market Players

List of Companies Profiled in the Report:

  • Air Liquide S.A
  • Air Product & Chemicals, Inc.
  • The Dow Chemical Company
  • Linde PLC
  • Merck KGAA
  • Samsung Electronics Co., Ltd.
  • Nanmat Technology Co. Ltd.
  • Adeka Corporation
  • Strem Chemicals, Inc.
  • Colnatec

Unique Offerings

  • Exhaustive coverage
  • The highest number of market tables and figures
  • Subscription-based model available
  • Guaranteed best price
  • Assured post sales research support with 10% customization free

Table of Contents

Chapter 1. Market Scope & Methodology
1.1 Market Definition
1.2 Objectives
1.3 Market Scope
1.4 Segmentation
1.4.1 Asia Pacific High-k And CVD ALD Metal Precursors Market, by Technology
1.4.2 Asia Pacific High-k And CVD ALD Metal Precursors Market, by Country
1.5 Research Methodology
Chapter 2. Market Overview
2.1 Introduction
2.1.1 Overview
2.1.1.1 Market Composition and Scenario
2.2 Key Factors Impacting the Market
2.2.1 Market Drivers
2.2.2 Market Restraints
Chapter 3. Asia Pacific High-k And CVD ALD Metal Precursors Market by Technology
3.1 Asia Pacific Interconnect Market by Country
3.2 Asia Pacific Capacitors Market by Country
3.3 Asia Pacific Gates Market by Country
Chapter 4. Asia Pacific High-k And CVD ALD Metal Precursors Market by Country
4.1 China High-k And CVD ALD Metal Precursors Market
4.1.1 China High-k And CVD ALD Metal Precursors Market by Technology
4.2 Japan High-k And CVD ALD Metal Precursors Market
4.2.1 Japan High-k And CVD ALD Metal Precursors Market by Technology
4.3 India High-k And CVD ALD Metal Precursors Market
4.3.1 India High-k And CVD ALD Metal Precursors Market by Technology
4.4 South Korea High-k And CVD ALD Metal Precursors Market
4.4.1 South Korea High-k And CVD ALD Metal Precursors Market by Technology
4.5 Singapore High-k And CVD ALD Metal Precursors Market
4.5.1 Singapore High-k And CVD ALD Metal Precursors Market by Technology
4.6 Malaysia High-k And CVD ALD Metal Precursors Market
4.6.1 Malaysia High-k And CVD ALD Metal Precursors Market by Technology
4.7 Rest of Asia Pacific High-k And CVD ALD Metal Precursors Market
4.7.1 Rest of Asia Pacific High-k And CVD ALD Metal Precursors Market by Technology
Chapter 5. Company Profiles
5.1 Merck Group
5.1.1 Company Overview
5.1.2 Financial Analysis
5.1.3 Segmental and Regional Analysis
5.1.4 Research & Development Expense
5.2 Samsung Electronics Co., Ltd. (Samsung Group)
5.2.1 Company Overview
5.2.2 Financial Analysis
5.2.3 Segmental and Regional Analysis
5.2.4 Research & Development Expense
5.2.5 SWOT Analysis
5.3 The Dow Chemical Company
5.3.1 Company Overview
5.3.2 Financial Analysis
5.3.3 Segmental and Regional Analysis
5.3.4 Research & Development Expenses
5.4 Air Products and Chemicals, Inc.
5.4.1 Company Overview
5.4.2 Financial Analysis
5.4.3 Segmental and Regional Analysis
5.4.4 Research & Development Expenses
5.5 Air Liquide S.A.
5.5.1 Company Overview
5.5.1 Financial Analysis
5.6 Linde PLC
5.6.1 Company Overview
5.6.2 Financial Analysis
5.6.3 Regional Analysis
5.6.4 Research & Development Expense
5.7 ADEKA Corporation
5.7.1 Company Overview
5.7.2 Financial Analysis
5.8 Nanmat Technology Co. Ltd.
5.8.1 Company Overview
5.9 Strem Chemicals, Inc. (Ascensus Specialties LLC)
5.9.1 Company Overview
5.10. Colnatec LLC
5.10.1 Company Overview

Companies Mentioned

  • Air Liquide S.A
  • Air Product & Chemicals, Inc.
  • The Dow Chemical Company
  • Linde PLC
  • Merck KGAA
  • Samsung Electronics Co., Ltd.
  • Nanmat Technology Co. Ltd.
  • Adeka Corporation
  • Strem Chemicals, Inc.
  • Colnatec

Methodology

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