The global high-k and CVD ALD metal precursors market size reached US$ 618.8 million in 2023. The market is projected to reach US$ 1,122.4 million by 2032, exhibiting a growth rate (CAGR) of 6.84% during 2023-2032. The increasing sales of consumer electronics, rising demand for autonomous and electric vehicles (EVs), and the growing use of high-k and CVD ALD metal precursors in various medical imaging devices represent some of the key factors driving the market.
High dielectric constant (High-K) is used as gate dielectrics in transistors to improve the capacitance and enhance the performance of the device. On the other hand, chemical vapor deposition (CVD) atomic layer deposition (ALD) is a technique that relies on metal precursors to deposit thin films onto a substrate. High-k and CVD ALD metal precursors are materials utilized in the semiconductor technology to deposit various metals, including titanium, tantalum, tungsten, and others. They are used in the manufacturing of various memory devices, such as dynamic random access memory (DRAM) and flash memory devices. At present, the rising trend of device miniaturization is catalyzing the demand for high-k and CVD ALD metal precursors across the globe.
High dielectric constant (High-K) is used as gate dielectrics in transistors to improve the capacitance and enhance the performance of the device. On the other hand, chemical vapor deposition (CVD) atomic layer deposition (ALD) is a technique that relies on metal precursors to deposit thin films onto a substrate. High-k and CVD ALD metal precursors are materials utilized in the semiconductor technology to deposit various metals, including titanium, tantalum, tungsten, and others. They are used in the manufacturing of various memory devices, such as dynamic random access memory (DRAM) and flash memory devices. At present, the rising trend of device miniaturization is catalyzing the demand for high-k and CVD ALD metal precursors across the globe.
High-k and CVD ALD Metal Precursors Market Trends
There is an increase in the need for high performance and energy efficient electronic devices. This, coupled with the rising sales of smartphones, laptops, tablets, gaming consoles, cameras, and television, represents one of the major factors driving the demand for high-k and CVD ALD metal precursors around the world. Moreover, the growing use of renewable energy sources is positively influencing the demand for high-k and CVD ALD metal precursors in energy storage and conversion devices, such as batteries and solar cells. In addition, high-k and CVD ALD metal precursors are employed in the automotive industry to improve the efficiency and reduce the size and weight of devices. They are used in advanced driver assistance systems (ADAS), such as cameras, radar, lidar, telematics systems, and infotainment systems, like displays, audio systems, and navigation systems to enhance the performance. High-k and CVD ALD metal precursors are also utilized in advanced safety systems, including lane departure warning systems and adaptive cruise control, to improve the sensitivity and response time. This, in confluence with the increasing sales of autonomous and electric vehicles (EVs) on account of rapid urbanization and inflating income levels, is contributing to the market growth. Apart from this, the rising usage of high-k and CVD ALD metal precursors in various medical imaging devices and biomedical sensors, such as X-ray, computed tomography (CT) scanners, and glucose sensors, is creating a positive outlook for the market.Key Market Segmentation:
The report provides an analysis of the key trends in each segment of the global high-k and CVD ALD metal precursors market, along with forecasts at the global, regional, and country level from 2023-2032. The report has categorized the market based on technology and end use.Technology Insights:
- Interconnect
- Capacitor/Memory
- Gates
End Use Insights:
- Consumer Electronics
- Aerospace and Defense
- IT and Telecommunication
- Industrial
- Automotive
- Healthcare
- Others
Regional Insights:
- North America
- United States
- Canada
- Asia-Pacific
- China
- Japan
- India
- South Korea
- Australia
- Indonesia
- Others
- Europe
- Germany
- France
- United Kingdom
- Italy
- Spain
- Russia
- Others
- Latin America
- Brazil
- Mexico
- Others
- Middle East and Africa
Competitive Landscape
The report has also provided a comprehensive analysis of the competitive landscape in the global high-k and CVD ALD metal precursors market. Detailed profiles of all major companies have also been provided. Some of the companies covered include Adeka Corporation, Dow Inc., Merck KGaA, Nanmat Technology Co. Ltd., Strem Chemicals Inc. (Ascensus Specialties LLC), Tri Chemical Laboratories Inc., etc.Key Questions Answered in This Report:
- How has the global high-k and CVD ALD metal precursors market performed so far and how will it perform in the coming years?
- What are the drivers, restraints, and opportunities in the global high-k and CVD ALD metal precursors market?
- What is the impact of each driver, restraint, and opportunity on the global high-k and CVD ALD metal precursors market?
- What are the key regional markets?
- Which countries represent the most attractive high-k and CVD ALD metal precursors markets?
- What is the breakup of the market based on the technology?
- Which is the most attractive technology in the high-k and CVD ALD metal precursors market?
- What is the breakup of the market based on the end use?
- Which is the most attractive end use in the high-k and CVD ALD metal precursors market?
- What is the competitive structure of the global high-k and CVD ALD metal precursors market?
- Who are the key players/companies in the global high-k and CVD ALD metal precursors market?
Table of Contents
1 Preface3 Executive Summary10 Value Chain Analysis12 Price Analysis
2 Scope and Methodology
4 Introduction
5 Global High-k And CVD ALD Metal Precursors Market
6 Market Breakup by Technology
7 Market Breakup by End Use
8 Market Breakup by Region
9 Drivers, Restraints, and Opportunities
11 Porters Five Forces Analysis
13 Competitive Landscape
List of Figures
List of Tables
Companies Mentioned
- Adeka Corporation
- Dow Inc.
- Merck KGaA
- Nanmat Technology Co. Ltd.
- Strem Chemicals Inc. (Ascensus Specialties LLC)
- Tri Chemical Laboratories Inc.
Methodology
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Table Information
Report Attribute | Details |
---|---|
No. of Pages | 148 |
Published | January 2024 |
Forecast Period | 2023 - 2032 |
Estimated Market Value ( USD | $ 618.8 Million |
Forecasted Market Value ( USD | $ 1122 Million |
Compound Annual Growth Rate | 6.8% |
Regions Covered | Global |
No. of Companies Mentioned | 6 |