Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
Table of Contents
Introduction and SummaryLord Broers
1. Early life
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2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
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3. Formation of cones and ridges on ion-etched surfaces
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4. Microfabrication in an SEM
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5. High Resolution Short Focal Length Lens Electron Probe
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6. Low-Loss Surface Microscopy in short focal length Probe
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7. Microfabrication in the 5� electron probe
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8. Nanodevices fabricated in the HR Probe
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9. Fabrication of Structures with Dimensions Below 10 nm
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10. Semiconductor Lithography and Processing
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11. Nanolithography at 400kV
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12. Last twenty years and future of semiconductor chips
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