The Latin America, Middle East and Africa High-k And CVD ALD Metal Precursors Market should witness market growth of 9.6% CAGR during the forecast period (2022-2028).
A variety of materials can be deposited on a surface via elimination processes between a halogen-functionalized metallic molecule and a silicon-based molecule. In the majority of metal ALD methods, fluor silane removal processes are used to deposit metal over substrate surfaces. Identical to thermal ALD, metal ALD can also deposit a range of metals at temperatures between 175 and 325 degrees Celsius.
Thermal and metal ALD utilizes temperatures that are higher than those of other procedures, but are significantly lower than those of other CVD methods. For the successful creation of innovative Chemical Vapor Deposition methods, the selection and design of suitable metal-organic precursors are critical. Customers prefer insulators with high dielectric constants because they play various crucial functions in contemporary semiconductor devices, such as reducing power consumption for Metal-Insulator-Semiconductor field-effect transistors.
Demand for metal precursors with a higher dielectric constant, such as aluminum, cobalt, hafnium, titanium, tungsten, tantalum, and zirconium, is anticipated to rise in the coming years. These precursors are used to produce thin metallic films. Due to its applicability in non-semiconductor domains and the exponential rise of the semiconductor industry, there have been significant advancements in the field of ALD.
South Africa's electronics industry is extremely diverse, encompassing everything from industrial appliances to consumer electronics and home appliances to telecommunications equipment. According to Statistics South Africa, the nation produces electrotechnical equipment yearly at a cost of more than R90 billion. In South Africa, both the consumer and industrial electronics industries possess exceptional skill sets. The production of electronics accounts for 4% of South Africa's overall manufacturing output.
The Brazil market dominated the LAMEA High-k And CVD ALD Metal Precursors Market by Country in 2021, and would continue to be a dominant market till 2028; thereby, achieving a market value of $12.1 million by 2028. The Argentina market is estimated to grow a CAGR of 10.1% during (2022-2028). Additionally, The UAE market would display a CAGR of 9.3% during (2022-2028).
Based on Technology, the market is segmented into Interconnect, Capacitors, and Gates. The report also covers geographical segmentation of High-k And CVD ALD Metal Precursors market. Based on countries, the market is segmented into Brazil, Argentina, UAE, Saudi Arabia, South Africa, Nigeria, and Rest of LAMEA.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Air Liquide S.A, Air Product & Chemicals, Inc., The Dow Chemical Company, Linde PLC, Merck KGAA, Samsung Electronics Co., Ltd., Nanmat Technology Co. Ltd., Adeka Corporation, Strem Chemicals, Inc., and Colnatec.
A variety of materials can be deposited on a surface via elimination processes between a halogen-functionalized metallic molecule and a silicon-based molecule. In the majority of metal ALD methods, fluor silane removal processes are used to deposit metal over substrate surfaces. Identical to thermal ALD, metal ALD can also deposit a range of metals at temperatures between 175 and 325 degrees Celsius.
Thermal and metal ALD utilizes temperatures that are higher than those of other procedures, but are significantly lower than those of other CVD methods. For the successful creation of innovative Chemical Vapor Deposition methods, the selection and design of suitable metal-organic precursors are critical. Customers prefer insulators with high dielectric constants because they play various crucial functions in contemporary semiconductor devices, such as reducing power consumption for Metal-Insulator-Semiconductor field-effect transistors.
Demand for metal precursors with a higher dielectric constant, such as aluminum, cobalt, hafnium, titanium, tungsten, tantalum, and zirconium, is anticipated to rise in the coming years. These precursors are used to produce thin metallic films. Due to its applicability in non-semiconductor domains and the exponential rise of the semiconductor industry, there have been significant advancements in the field of ALD.
South Africa's electronics industry is extremely diverse, encompassing everything from industrial appliances to consumer electronics and home appliances to telecommunications equipment. According to Statistics South Africa, the nation produces electrotechnical equipment yearly at a cost of more than R90 billion. In South Africa, both the consumer and industrial electronics industries possess exceptional skill sets. The production of electronics accounts for 4% of South Africa's overall manufacturing output.
The Brazil market dominated the LAMEA High-k And CVD ALD Metal Precursors Market by Country in 2021, and would continue to be a dominant market till 2028; thereby, achieving a market value of $12.1 million by 2028. The Argentina market is estimated to grow a CAGR of 10.1% during (2022-2028). Additionally, The UAE market would display a CAGR of 9.3% during (2022-2028).
Based on Technology, the market is segmented into Interconnect, Capacitors, and Gates. The report also covers geographical segmentation of High-k And CVD ALD Metal Precursors market. Based on countries, the market is segmented into Brazil, Argentina, UAE, Saudi Arabia, South Africa, Nigeria, and Rest of LAMEA.
The market research report covers the analysis of key stake holders of the market. Key companies profiled in the report include Air Liquide S.A, Air Product & Chemicals, Inc., The Dow Chemical Company, Linde PLC, Merck KGAA, Samsung Electronics Co., Ltd., Nanmat Technology Co. Ltd., Adeka Corporation, Strem Chemicals, Inc., and Colnatec.
Scope of the Study
By Technology
- Interconnect
- Capacitors
- Gates
By Country
- Brazil
- Argentina
- UAE
- Saudi Arabia
- South Africa
- Nigeria
- Rest of LAMEA
Key Market Players
List of Companies Profiled in the Report:
- Air Liquide S.A
- Air Product & Chemicals, Inc.
- The Dow Chemical Company
- Linde PLC
- Merck KGAA
- Samsung Electronics Co., Ltd.
- Nanmat Technology Co. Ltd.
- Adeka Corporation
- Strem Chemicals, Inc.
- Colnatec
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- The highest number of market tables and figures
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Table of Contents
Chapter 1. Market Scope & Methodology
Chapter 2. Market Overview
Chapter 3. LAMEA High-k And CVD ALD Metal Precursors Market by Technology
Chapter 4. LAMEA High-k And CVD ALD Metal Precursors Market by Country
Chapter 5. Company Profiles
Companies Mentioned
- Air Liquide S.A
- Air Product & Chemicals, Inc.
- The Dow Chemical Company
- Linde PLC
- Merck KGAA
- Samsung Electronics Co., Ltd.
- Nanmat Technology Co. Ltd.
- Adeka Corporation
- Strem Chemicals, Inc.
- Colnatec
Methodology
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