Results for tag: "Ion Beam Sputtering"

Ion Beam Sputtering (IBS) is a technology used in the semiconductor industry to deposit thin films of material onto a substrate. It is a physical vapor deposition (PVD) process that uses a beam of ions to sputter, or remove, material from a target and deposit it onto the substrate. The process is used to create thin films of materials such as metals, oxides, and nitrides, which are used in the fabrication of semiconductor devices. IBS is a cost-effective and reliable method of depositing thin films, and is used in a variety of applications, including the fabrication of integrated circuits, memory chips, and other semiconductor devices. IBS is a mature technology, and is widely used in the semiconductor industry. It is used to deposit thin films of materials such as metals, oxides, and nitrides, which are used in the fabrication of semiconductor devices. The process is also used to create thin films of materials for use in other industries, such as the automotive and aerospace industries. Some companies in the Ion Beam Sputtering market include Applied Materials, Lam Research, Hitachi High-Technologies, Oxford Instruments, and ULVAC Technologies. Show Less Read more